IMS Nanofabrication

IMS Nanofabrication

Nanotechnologieforschung

Brunn am Gebirge, Niederösterreich 5.307 Follower:innen

We write the future.

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IMS Nanofabrication GmbH is an Austrian business and the global technology leader for multi-beam mask writers. Our customers are the largest chip manufacturers in the world, who rely on IMS' technology to produce current and future chip generations. Our innovative multi-beam writers play a key role in chip manufacturing and provide significant added value to the semiconductor industry. They are continually customized and refined by an interdisciplinary team, in line with the latest market demands. Over the last ten years, we have perfected our electron-based multi-beam technology. The first generation of systems (MBMW-101 – 1st generation Multi-Beam Mask Writer) is successfully operating all over the world. The 2nd generation Multi-Beam Mask Writer, MBMW-201 has entered the mask writer market in Q1 2019 for the 5nm technology node. At IMS, our know-how is shaped by a diverse team of experts from a multitude of disciplines, such as physics, electronics, development, project management, supply chain management, production, service and administration. “Our multi-beam technology is the key to the evolution of the semiconductor industry.” Dr. Elmar Platzgummer, CEO Get started with one of Austria's most innovative companies. Are you looking for new challenges in a globally acting high-tech company? Would you like to work in a multi-disciplinary and international team? As the “hidden champion” of the semiconductor industry, IMS specializes in innovation for the nanotechnology sector. This technology is of high strategic importance for the world’s leading chip manufacturers and a pivotal tool for the production of today’s and tomorrow’s chip generations.

Website
www.ims.co.at
Branche
Nanotechnologieforschung
Größe
501–1.000 Beschäftigte
Hauptsitz
Brunn am Gebirge, Niederösterreich
Art
Kapitalgesellschaft (AG, GmbH, UG etc.)
Gegründet
1985
Spezialgebiete
semiconductor industry, Nanotechnologies, Mask Writer und Elektron Beam Lithography

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