RAITH Group

The RAITH Micrograph Award 2024 is open for submissions until December 15 this year! This gives you plenty of time to go through your work and send your best applications to us. That way you get the chance to win a fully sponsored trip to any nanotechnology related conference of your choice. So make sure to select your favorite images and send them to us. All details regarding the Micrograph Award can be found on our website: https://ow.ly/Qsg650U2gBH

This is your last chance to register for the PerfectShapes webinar! Join our colleagues Frank Nouvertné and Benjamin Oevermann as they present an innovative way of fracturing in EBL. They will explain what fracturing in EBL is in general, how RAITH revolutionizes the way fracturing is done, and how PerfectShapes helps to optimize pattern fidelity, minimize line edge roughness, data volume and processing time. Join them and register now: https://ow.ly/zjJM50U0cPI

We are at the "International Symposium for Testing and Failure Analysis" (ISTFA) in San Diego. Come by our booth and get to know our new SIMS Nanoanalytics system IONMASTER.

Our customers at the University of Münster used their VELION in combination with a EBPG to develop cutting-edge optical devices. Silicon nitride waveguides were produced with the help of the EBPG in which for Si ions were then implanted with the VELION, enabling refractive index and mode trimming. With that, they fabricated photonic circuits with asymmetric couplers for mode conversion, essential for multimode photonic accelerators in neuromorphic computing research. These developments also pave the way for mode-division multiplexing (MDM) devices in optical telecom, enhancing data rates by allowing multiple channels at one wavelength. MDM is considered the next step in advancing optical fiber networks beyond WDM. Read the whole article here: https://ow.ly/HwwQ50TpbBw

Another webinar is just around the corner: Join our colleagues Frank Nouvertné and Benjamin Oevermann as they take you on a journey through our PerfectShapes technology. In an exciting webinar, they will explain what fracturing in EBL is in general, how RAITH revolutionizes the way fracturing is done, and how PerfectShapes helps to optimize pattern fidelity, minimize line edge roughness, data volume and processing time. Learn all about innovative and advanced design fracturing and register for the webinar now: https://ow.ly/6Mgv50TOjIw

This is your time to shine: share your work and win a fully sponsored trip to a conference of your choice! The RAITH Micrograph Award 2024 is open for submissions and we look forward to seeing what you have been doing with your RAITH system. To enter the RAITH Micrograph Award, all you need to do is upload 1-3 SEM images of your work done with a RAITH system or lithography attachment, describe what the image shows - and that's it! Don't miss your chance and share your work with us now: https://ow.ly/24lO50TNHfj

We are happy to be part of the PIC Summit Europe - our colleagues are looking forward to talking to you! See you in Eindhoven on October 15 and 16.

Our webinar on ErgoFlow is happening next week already! Make sure to register now to join our colleagues Frank Nouvertné, Jörg Stodolka and Guido Piaszenski as they dive into the highly ergonomic human-machine interface ErgoFlow. Find out how ErgoFlow offers a straightforward lithography exposure setup which enables EBL results at the push of a button. Register now for the webinar on October 14: https://ow.ly/lTro50THLw8

Dr. Mario Hentschel (University of Stuttgart) participated in the 2023 Micrograph Award and submitted this great work, created using a RAITH ionLINE. He describes his work in the following: "Manipulating light on the nanoscale has become a central challenge in metadevices, resonant surfaces, nanoscale optical sensors, and many more, and it is largely based on resonant light confinement in dispersive and lossy metals and dielectrics. We experimentally implement a novel strategy for dielectric nanophotonics: Resonant subwavelength localized confinement of light in air. We demonstrate that voids created in high-index dielectric host materials support localized resonant modes with exceptional optical properties. Due to the confinement in air, the modes do not suffer from the loss and dispersion of the dielectric host medium, thus even allowing for resonant confinement of UV light. We experimentally realize these resonant Mie voids by focused ion beam milling into bulk silicon wafers. The combination of resonant dielectric Mie voids with dielectric nanoparticles will more than double the parameter space for the future design of metasurfaces and other micro- and nanoscale optical elements and enable novel antenna and structure designs which benefit from the full access to the modal field inside the void. This artistic picture turns an SEM image of Mie voids into an optical illusion. The image shows a tilted view image of an array of two different size and depth Mie voids in a silicon substrate. Due the perfect and identical shape of the voids (aided by the very homogenous milling in the crystalline silicon substrate), the sutures appear as voids or as hills, depending on the orientation but also depending on the observer." Thank you again for sharing this amazing work! Do you also want to share your work? Register here and participate for the RAITH Micrograph Award 2024: https://ow.ly/WA4E50TGzcA

We are excited to announce another webinar: ErgoFlow – EBL results at the push of a button. Join our colleagues Frank Nouvertné, Jörg Stodolka and Guido Piaszenski as they dive into the highly ergonomic human-machine interface ErgoFlow. Find out how ErgoFlow offers a straightforward lithography exposure setup which enables EBL results at the push of a button. Register now for the webinar on October 14: https://ow.ly/JGG050TB02v