Nano Vacuum’s Post

Watch Now! The New Generation of NanoFrazor! Decapede option with Parallel writing with 10 tips is available! The NanoFrazor by Heidelberg Instruments is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes. More Here: https://bit.ly/3V3vPtq #lithography #2Dmaterials #3Dmaterials #photonics #nanofluidics #spintronics #grayscale #directwrite #laserlithography #quantumcomputing #nanofabrication #nanovacuum #heidelberginstruments

Introducing a New Generation of NanoFrazor! Decapede option with Parallel writing with 10 tips is available! The NanoFrazor by Heidelberg Instruments is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), enabling advanced research in various application areas such as quantum devices, 1D/2D materials, quantum dots, Dolan bridges, Josephson junctions, and nanoscale arrays. It excels in complex applications such as grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and any local material modification through heat, including chemical reactions and physical phase changes. More Here: https://bit.ly/3V3vPtq #lithography #2Dmaterials #3Dmaterials #photonics #nanofluidics #spintronics #grayscale #directwrite #laserlithography #quantum computing #nanofabrication #nanovacuum #heidelberginstruments

🔎 𝗔𝗣𝗣𝗟𝗜𝗖𝗔𝗧𝗜𝗢𝗡 𝗙𝗢𝗖𝗨𝗦 - LUMIBIRD lasers for Pulsed Laser Deposition Pulsed Laser Deposition is a technique used to grow thin films of a wide variety of materials in electronics, photonics, and material science research. A high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material to be deposited. This material is vaporized from the target, enabling it to be deposited as a thin film on a substrate. Using pulsed YAG for PLD has a number of advantages, including: ➡️ high spatial quality for good focusing and efficient ablation ➡️ short pulses for minimal heat diffusion & precise material removal ➡️ high energy stability for consistent film growth ➡️ wavelength flexibility for ablating a wide range of materials ➡️ compactness & ruggedness for easy integration 📌 With 50+ years of experience in nanosecond YAG lasers, Lumibird offers an incomparable choice of models for PLD applications. To find out more: Take a look at the slides 👇 Check our website 👉https://lnkd.in/dE9_97ts Or visit our virtual booth 👉https://lnkd.in/dFukwJFm #PulsedLaserDeposition

🔎 𝗔𝗣𝗣𝗟𝗜𝗖𝗔𝗧𝗜𝗢𝗡 𝗙𝗢𝗖𝗨𝗦 - LUMIBIRD lasers for Pulsed Laser Deposition Pulsed Laser Deposition is a technique used to grow thin films of a wide variety of materials in electronics, photonics, and material science research. A high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material to be deposited. This material is vaporized from the target, enabling it to be deposited as a thin film on a substrate. Using pulsed YAG for PLD has a number of advantages, including: ➡️ high spatial quality for good focusing and efficient ablation ➡️ short pulses for minimal heat diffusion & precise material removal ➡️ high energy stability for consistent film growth ➡️ wavelength flexibility for ablating a wide range of materials ➡️ compactness & ruggedness for easy integration 📌 With 50+ years of experience in nanosecond YAG lasers, Lumibird offers an incomparable choice of models for PLD applications. To find out more: Take a look at the slides 👇 Check our website 👉https://lnkd.in/dE9_97ts Or visit our virtual booth 👉https://lnkd.in/dFukwJFm #PulsedLaserDeposition

🔬 Exciting Innovation in Nanoscale Imaging: Introducing the Nano-Observer II AFM Breaking barriers in atomic force microscopy! We're proud to showcase the Nano-Observer II, our latest advancement in AFM technology that combines exceptional performance with unprecedented user accessibility. Key innovations that set it apart: ✨ Three-Click Excellence: Achieve high-quality images with our revolutionary AutoScan Software 🎯 Smart Integration: Features a 24-bit low-noise USB controller and advanced lock-in capabilities 🔬 Versatile Applications Across Multiple Fields: • Photovoltaics: Advanced surface analysis for solar cell optimization and efficiency studies • Electrochemistry: Precise characterization of electrode surfaces and reaction mechanisms • Corrosion Studies: Real-time monitoring of surface degradation and protective coatings • Materials Science: Comprehensive analysis of composite materials and thin films • Semiconductor Research: High-resolution imaging of device structures and defect analysis • Polymer Studies: Detailed examination of morphology and mechanical properties • Biological Samples: Gentle imaging of delicate cellular structures and biomaterials • 2D Materials: Atomic-level characterization of graphene and other 2D materials • Nanomechanical Analysis: Precise measurement of material properties at the nanoscale • Surface Science: Detailed topographical and chemical mapping of various surfaces Each application is supported by our advanced imaging modes, ensuring optimal results for your specific research needs. 💡 Revolutionary Modes: Including HD-KFM™ III for unprecedented surface potential mapping 📊 ResiScope™ III: Measure electrical resistance across an impressive 10 orders of magnitude Perfect for both newcomers and experts in: • Materials Science • Semiconductor Research • Photovoltaics • Biological Research • 2D Materials Characterization Experience the future of nanoscale imaging with the most user-friendly and powerful AFM system yet. Want to learn more about how the Nano-Observer II can transform your research? Connect with us today! #AtomicForceMicroscopy #AFM #Nanotechnology #MaterialsScience #Research #Innovation #Microscopy #SurfaceScience #NanoImaging #ScientificInstrumentation #CSInstruments #LabEquipment #ResearchAndDevelopment #STEM #NanoObserverII #SurfaceAnalysis #MaterialsCharacterization #Semiconductors #Photovoltaics #TechnologyInnovation

https://lnkd.in/gZ65k6cm Defect inspection results are reported using after etch voltage contrast (VC) metrology as well as after metallization. By comparing top-down scanning electron microscopy (SEM) and VC images, the VC technique was proven to detect the close defective CHs not only on the top surface but also at the bottom of CHs. This is confirmed on cross section inspection using transmission electron microscopy (TEM) metrology.

Low-loss and uniform alumina thin films are fabricated using low-temperature plasma-assisted reactive magnetron sputtering for optical coatings and integrated photonics.

I am thrilled to announce our last paper published in APL Photonics. In this work, we explore the impact of gain medium on linewidth narrowing in integrated self-injection locked III–V/SiN lasers. In particular, we focus on the effects of carrier densities of states in zero- and two-dimensional structures due to quantum-dot and quantum-well confinement. A collaboration with Prof. John Bowers and Dr. Bozhang DONG (UC Santa Barbara), Dr. Weng Chow (Sandia National Laboratories), and Prof. Yating Wan KAUST (King Abdullah University of Science and Technology). For integrated III–V/SiN lasers, our analysis indicates Hz-level linewidth performance for both quantum-dot and quantum-well gain media due to overcoming the difference in carrier-induced refractive index by incorporating a high-Q SiN passive resonator. Trade-offs are also explored between linewidth, output power, and threshold current. https://lnkd.in/g-cwsmUt

Ensuring a lower defect count in EUV masks is crucial for the advancement of EUV lithography, a key technology for achieving higher technology nodes and lower pattern resolutions. I am excited to announce that our research on "Automatic classification of EUV mask defects inspected using DUV inspection optics" has been published by SPIE and presented at the SPIE Photomask Technology + Extreme Ultraviolet Lithography (2024) conference. This work, conducted in collaboration between Siemens EDA (Siemens Digital Industries Software) and SK hynix, addresses the critical challenge of defect management in EUV masks. By utilizing DUV inspection optics for efficient pre-filtering and leveraging the automatic defect classification algorithms of Design with Calibre® DefectClassify, we provide a reliable solution for accurately classifying mask defects under highly sensitive conditions. This research is pivotal for ensuring high-quality mask production and reducing costs in semiconductor manufacturing. I would like to extend my heartfelt gratitude to my manager, Mark Pereira, my Tech Lead, Samir B.V.R., and our marketing manager, Sankaranarayanan Paninjath, for their invaluable, unwavering support and guidance throughout this project. Paper: https://lnkd.in/g-2XzKcu https://lnkd.in/gSyXd4Yj SPIE: The International Society for Optics and Photonics SPIE, the international society for optics and photonics #SPIEPhotomaskEUV

With an optical microscope, we are typically blind at the nanoscale. However, in-situ Scanning Probe Microscopy (SPM) imaging offers a high-resolution method that surpasses traditional optical microscopy. 🏆 It provides much higher resolution both in the normal direction (1 Ångström) and in the lateral direction (3 - 10 nm). This advanced technique allows for precise positioning prior to mechanical testing, as demonstrated here. It’s no surprise to see the perfect alignment of hardness test marks with the grid structure on the sample surface. In-situ SPM imaging is revolutionizing our ability to observe and manipulate materials at the nanoscale, opening up new possibilities in materials science and engineering. #TI990 #Bruker