Volta Foundation’s Post

🚨 WEBINAR ALERT🚨 Join Barbara Hughes for an informative webinar on atomic layer deposition for li-ion cells hosted by Volta Foundation 📣 Battery Material Performance Enhancer: Atomic Layer Deposition Nanocoatings for Li-Ion Cells 🗓 July 23, 2024 ⏱ 11 AM ET 💻 Register at https://lnkd.in/gzf5hCaQ 🔋 The battery industry is in constant pursuit of new materials and processes that can increase cell performance to enable more reliable products. Forge Nano’s proprietary Atomic Layer Deposition technology, Atomic Armor, optimizes battery materials by applying protective nanocoatings engineered to improve battery product performance and lifetime. The webinar will cover Forge Nano’s work on high-nickel NMC, graphite and silicon anodes, and give a glimpse into the newly formed Forge Battery, which intends to produce cylindrical cells using ALD-coated materials at gigawatt hour scale. #VoltaFoundation #WebinarSeries #BatteryEvents #BatteryWebinars #NMC #Graphite #SiliconAndoes #ForgeBattery #ForgeNano #BatteryCells #CellEngineering #AtomicLayerDeposition Myra S. Dyer, PE Yen T. Yeh Dana Bubonovich

Catalyzed thermal #ALDep processes are poised to make big waves for scaling #semiconductor applications, particularly for those moving to high aspect ratios where conformal metal and nitride depositions are necessary, like copper barrier seed stacks in through silicon vias (TSVs). Check out our latest article introducing CRISP, our suite of catalyzed thermal ALD processes. Learn how catalyzed ALD works, how we have made it viable for manufacturing and how the process and film properties compare to PE-ALD. Full article here 👉 https://lnkd.in/dbEefPDd ALD Fundamental Disclaimer: PE-ALD is capable of achieving conformal depositions in HAR structures, especially with oxide films. A lot of fantastic work has gone into dispelling this generalization. However, these depositions still may need long plasma exposures, and some critical materials for semiconductor applications, like copper, are difficult to scale to higher ARs.

A very interesting pitch indeed. Plasma based process doesn’t typically works in case of HAR and thermal processes require very high temperature unless either catalyzed OR a specifically designed silicon precursor in which the catalytic amine functionality is embedded as a single precursor which still requires an oxidizing coreactant. The drawback is carbon and or nitrogen containing films. The same is true for a pyridine catalyzed reaction. Also, pyridine is a good theoretical example but doesn’t works that well at HAR. Simpler smaller amines works far better. In the end, slow deposition often results in denser films which in turn results in low leakage current and higher breakdown voltage. The reduction in time seems like faster deposition but in reality the deposition step may still be similar or even slower but purge time has been substantially reduced. Sounds like combination of lower dose and smaller volatile catalyst. However, the choice of plasma vs thermal process depends on the desired electrical properties as well. Overall a good read. Thanks for sharing. A clean deposition of oxide at 27 C with better film properties is interesting! #semiconductors #ald #atomiclayerdeposition

Feel free to join this webinar about how batteries can benefit from Spatial ALD technology!

Great event to understand the benefits of Atomic Layer Deposition on battery materials.

NANOSCALE ENERGY STORAGE: A twisted stack of three layers of graphene, rather than two layers, improves the ease of manufacturing and the speed of electrochemical reactions. Results could improve nano electrochemical devices or electrocatalysts to advance energy storage or conversion, increasing speed and capacity. When adding a third layer of graphene, the hexagonal lattices of the 2D material do not perfectly align and form a non-repeating pattern. When twisted at a small angle, the electrical conductivity increases due to increases in the density of states. Read more here: https://bit.ly/3VGP8sD

<The 339th ICYS Seminar> ・On-Surface Synthesis of Silicon or Germanium Incorporated Carbon Nanostructures ・Diamond Field-effect Transistor Utilizing h-BN Gate Insulator #silicon, #germanium, #carbon, #nanostructure, #diamond, #transistor, #insulator,

🛠️ Unveiling precision: The power of sputtering Sputtering technology revolutionizes thin film deposition, operating within a plasma environment with electrifying precision.⚡️ Here's the gist: Electrons, released from the negatively charged target source, collide with Argon gas atoms, launching positively charged ions towards the target. This collision triggers the ejection of atomic-sized particles, coating the substrate with a thin, uniform film. 🎯 By harnessing high-energy particles, sputtering achieves unmatched purity and precision, surpassing traditional thermal energies. Controlled by factors like energy and surface binding energy, sputter yield ensures meticulous control over the coating process. 🔬 With methods like ion beam and reactive sputtering, sputtering technology sets new standards in precision engineering. 🚀 #SputteringTechnology #PrecisionEngineering #InnovationLeadership

How can we advance battery research with new materials and optimized performance? Raman microspectroscopy offers non-destructive, detailed insights for lithium-based batteries. Explore three real-life examples from Bruker Optics, including carbon analysis in flexible electrodes. Download the resource for free here: https://lnkd.in/gX5tbsnE #batterytesting #Ramanmicroscopy #raman #analyticalchemistry #carbonanalysis

Investigating failure mechanisms of solid electrolyte interphase in silicon particles